Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1982-09-17
1984-02-07
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430907, 20415915, 20415917, G03C 168
Patent
active
044304170
ABSTRACT:
Photopolymerizable mixtures of (a) one or more block copolymers, (b) one or more photopolymerizable, ethylenically unsaturated, low molecular weight compounds and (c) a photopolymerization initiator, with or without (d) other additives, contain as component (a) block copolymers which are composed solely of elastomeric polymer blocks, and contain two or more elastomeric polymer blocks having a glass transition temperature of from -20.degree. C. to +15.degree. C., linked by one or more elastomeric polymer blocks having a glass transition temperature of below -20.degree. C.
REFERENCES:
patent: 3674486 (1972-07-01), Milgrom
patent: 4045231 (1977-08-01), Toda et al.
patent: 4151057 (1979-04-01), St. Clair et al.
patent: 4162919 (1979-07-01), Richter et al.
patent: 4179531 (1979-12-01), Hein et al.
patent: 4197130 (1980-04-01), Nakamura et al.
patent: 4265986 (1981-05-01), Allen et al.
patent: 4266005 (1981-05-01), Nakamura et al.
patent: 4320188 (1982-03-01), Heinz et al.
patent: 4394435 (1983-07-01), Farber et al.
Foster D. Snell and Leslie S. Ettre (eds.), Encyclopedia of Industrial Chemical Analysis, vol. 12, "Elastomers, Synthetic", John Wiley and Sons, Inc., New York, 1971, pp. 81-88, 132-134.
Heinz Gerhard
Mueller Wolfgang F.
Richter Peter
BASF - Aktiengesellschaft
Hamilton Cynthia
Kittle John E.
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