Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-05-26
1993-03-30
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430285, 430287, 430325, 430330, 522 63, 522 67, 522 34, G03F 7037, G03F 7031
Patent
active
051983257
ABSTRACT:
A photopolymerizable mixture for producing relief structures composed of highly heat-resistant polymers is described which is composed essentially of a soluble prepolymer containing photosensitive radicals bound in an ester-like manner to carboxyl groups, monomers and a photoinitiator, wherein the photoinitiator carries at least one trihalomethyl group which reacts when exposed to light. Of advantage is the fact that, even after exposure times which are by a factor of 4 to 5 shorter compared with conventional photopolymerizable mixtures, sharp-edged resist images can be obtained with a resolution of less than 3 .mu.m.
REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3957512 (1976-05-01), Kleeberg
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4040831 (1977-01-01), Rubner
patent: 4045223 (1977-08-01), Rubner et al.
patent: 4088489 (1978-05-01), Rubner et al.
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4189323 (1980-02-01), Buhr
patent: 4329419 (1982-05-01), Goff et al.
patent: 4369247 (1983-01-01), Goff et al.
patent: 4410612 (1983-10-01), Goff et al.
patent: 4414312 (1983-11-01), Goff et al.
patent: 4579809 (1986-04-01), Irving
patent: 4619998 (1986-10-01), Buhr
patent: 4696888 (1987-09-01), Buhr
patent: 4701300 (1987-10-01), Merren et al.
patent: 4774163 (1988-09-01), Higashi
J. Kosar, "Light-Sensitive Systems: Chemistry and Application of Non-Silver Halide Photographic Processes", 1965, pp. 180-181.
Buhr Gerhard
Eckes Charlotte
Hupfer Bernd
Bowers Jr. Charles L.
Chu John S.
Hoechst Aktiengesellschaft
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