Photopolymerizable mixture and photopolymerizable copying materi

Details Photopolymerizable mixture and photopolymerizable copying materi Photopolymerizable mixture and photopolymerizable copying materi

1983-06-14

1984-07-03

Kittle, John F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430288, 20415915, G03C 168, G03C 174

Patent

active

044580061

ABSTRACT:
Disclosed are a photopolymerizable mixture and photopolymerizable copy materials made therefrom. The mixture contains a polymerizable compound having terminal acrylic or methacrylic acid ester groups and being selected from a compound of the formula I ##STR1## wherein R.sub.1 is a naphthylene group, a biphenyldiyl group or a dinaphthyl-methanediyl group or a group formed by two phenylene groups which are linked by a bridge comprised of an oxygen atom, a sulphur atom, a sulfone group or an alkylene group which is substituted by at least one carboxylic acid group, carboxylic acid alkyl ester groups, halogen atom or phenyl group, or by such a substituted alkylene group which is connected to the group R.sub.1 of another molecule via said substituent;

REFERENCES:
patent: 3515552 (1970-06-01), Smith
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patent: 3871885 (1975-03-01), Hertler
patent: 4180403 (1979-12-01), Nacci et al.
patent: 4264708 (1981-04-01), Chambers et al.
patent: 4275142 (1981-06-01), Hosaka et al.
patent: 4298519 (1981-11-01), Cordes et al.
patent: 4308338 (1981-12-01), Chambers et al.
patent: 4372836 (1983-02-01), Schmitt et al.

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