Photopolymerizable compositions containing prepolymers with olef

Details Photopolymerizable compositions containing prepolymers with olef Photopolymerizable compositions containing prepolymers with olef

1984-02-02

1985-10-22

Downey, Mark F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430287, 430325, 430330, 430925, 430916, 430947, 430284, 20415924, 20415918, G03C 170, G03C 516

Patent

active

045488916

ABSTRACT:
The invention relates to photopolymerizable compositions comprising (a) a prepolymer containing photopolymerizable olefinic double bonds, (b) photoinitiator of the formula ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1, and optionally (c) an ester of acrylic or methacrylic acid or an allyl ether or allyl ester of a polyol.
Owing to their excellent light sensitivity, these compositions are suitable for the economic production of high temperature resistant protective layers and relief structures having excellent resolution and good contours.

REFERENCES:
patent: 3717558 (1973-02-01), McGinniss
patent: 3740305 (1973-06-01), Hoback et al.
patent: 3957512 (1976-05-01), Kleeburg et al.
patent: 4030948 (1977-06-01), Berger
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4126466 (1978-11-01), Roos
patent: 4173673 (1979-11-01), Bratt et al.
patent: 4287294 (1981-09-01), Rubner et al.
patent: 4329419 (1982-05-01), Goff et al.
patent: 4414312 (1983-11-01), Goff et al.
patent: 4454220 (1984-06-01), Goff
Hsueh-Sung Tung and Carl H. Brubaker, Jr., Inorganica Chimica Acta, vol. 52, (1981), pp. 197-204.
R. Rubner, Siemens Forsch.-u.Entwickl.-Ber. Bd. 5 (1976), No. 2, pp. 92-97.
Kaeriyama, Kyoji et al., Chemical Abstracts, vol. 85, 1976, Columbus, Ohio, U.S.A., "Effect of Titanocene Dichloride as Sensitizer for Photopolymerization" Abstract No. 85:21953h, from Sen'i Kobunshi Zairyo Kenkyusho Kenkyu Hokoku, 1975, vol. 108, 21-27.
M. A. Chaudhari et al., J. Organometal Chem., 2, 206, (1964).
C. Tamborski et al., J. Organometal Chem., 4, 446, (1965).

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