Photopolymerizable compositions containing elastomers and photo-

Details Photopolymerizable compositions containing elastomers and photo- Photopolymerizable compositions containing elastomers and photo-

1980-10-17

1982-03-16

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430286, 430905, 430910, 20415915, 20415922, G03C 168

Patent

active

043201881

ABSTRACT:
Photopolymerizable compositions based on an elastomeric styrene-diene block polymer, one or more photopolymerizable olefinically unsaturated monomers and one or more photopolymerization initiators exhibit improved properties if they contain, as an essential constituent, an elastomeric block copolymer of the general structure A-B-C, where A is a thermoplastic, non-elastomeric polymer block based on styrene compounds and having a second order transition point above +25.degree. C., B is an elastomeric polymer block based on butadiene and/or isoprene and having a second order transition point below -20.degree. C. and C is a polymer block, different from B, having a second order transition point of from -30.degree. C. to +15.degree. C., C being either a homopolymer or copolymer block based on butadiene or isoprene or a random copolymer block based on conjugated dienes and styrene compounds. The photopolymerizable compositions may be used, inter alia, for the production of photo-curable adhesives, resilient and flexible sheet material and, in particular, flexographic relief printing plates.

REFERENCES:
patent: 2948611 (1960-08-01), Barney
patent: 3024180 (1962-03-01), McGraw
patent: 3674486 (1972-07-01), Milgrom
patent: 3798035 (1974-03-01), Varga et al.
patent: 3951657 (1976-04-01), Recchia et al.
patent: 4162919 (1979-07-01), Richter et al.
patent: 4179531 (1979-12-01), Hein

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