Photopolymerizable compositions and elements containing acid to

Details Photopolymerizable compositions and elements containing acid to Photopolymerizable compositions and elements containing acid to

1983-08-15

1985-04-09

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430275, 430277, 20415915, G03C 194, G03C 168

Patent

active

045102309

ABSTRACT:
Aqueous processable photopolymerizable compositions comprising a polymerizable ethylenically unsaturated monomer, a photoinitiator or photoinitiator system, and acid binder are described which give increased resistance to stain or scum formation on copper surfaces upon incorporation of an acid having a molecular weight not greater than 300 with a solubility of at least 0.01 grams in 100 grams water at 20.degree. C. and a dissociation constant in a range from 1.times.10.sup.-5 to 5.times.10.sup.-2. Water soluble acids which readily give up protons such as citric, malonic, malic, and maleic and are suitable.

REFERENCES:
patent: 3859099 (1975-01-01), Petropoulos et al.
patent: 4347303 (1982-08-01), Asano et al.
Laurence Urdang and Stuart B. Flexner (eds), "directly", The Random House College Dictionary, (Random House, Inc., New York, New York), 1973, p. 376.

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