Photopolymerizable compositions

Details Photopolymerizable compositions Photopolymerizable compositions

1990-12-06

1992-09-15

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 522120, G03F 7033

Patent

active

051477599

ABSTRACT:
A photopolymerizable composition composed principally of an acrylic linear copolymer, an ethylenically-unsaturated compound and a photoinitiator and adapted to fabricate printed circuit boards. The ethylenically-unsaturated compound contains a specific acrylic ester. The photopolymerizable composition can be developed with an aqueous mild alkaline solution.

REFERENCES:
patent: 4157261 (1979-06-01), Takeda
patent: 4636534 (1987-01-01), Nawata et al.
patent: 4725524 (1988-02-01), Elzer et al.
patent: 4764452 (1988-08-01), Ohno
Chemical Abstract No. 102:15117s (1985).

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