Photopolymerizable compositions

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430281, 430915, 430921, 430920, 430926, 20415924, G03C 168

Patent

active

045045739

ABSTRACT:
A high sensitivity photopolymerizable composition is disclosed. The composition includes a polymerizable compound having an ethylenically unsaturated bond and a photopolymerizable initiator represented by the general formula (I). ##STR1## The substituents within general formula (I) are defined within the specification. The composition has improved sensitivity and the initiator provides an increased polymerization rate. The composition may further include Michler's ketone and a N-methyl-2-benzoyl-.beta.-naphthothiazolin.

REFERENCES:
patent: 2908667 (1959-10-01), Williams
patent: 4272609 (1981-06-01), Klupfel
Badr et al., Bulletin of the Chemical Society of Japan, vol. 53, 1980, pp. 2389-2392.

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