Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1984-03-22
1985-03-12
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430915, 430921, 430920, 430926, 20415924, G03C 168
Patent
active
045045739
ABSTRACT:
A high sensitivity photopolymerizable composition is disclosed. The composition includes a polymerizable compound having an ethylenically unsaturated bond and a photopolymerizable initiator represented by the general formula (I). ##STR1## The substituents within general formula (I) are defined within the specification. The composition has improved sensitivity and the initiator provides an increased polymerization rate. The composition may further include Michler's ketone and a N-methyl-2-benzoyl-.beta.-naphthothiazolin.
REFERENCES:
patent: 2908667 (1959-10-01), Williams
patent: 4272609 (1981-06-01), Klupfel
Badr et al., Bulletin of the Chemical Society of Japan, vol. 53, 1980, pp. 2389-2392.
Ishikawa Shun-ichi
Nagano Teruo
Shinozaki Fumiaki
Tamoto Koji
Fuji Photo Film Co. , Ltd.
Hamilton Cynthia
Kittle John E.
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