Photopolymerizable compositions

Details Photopolymerizable compositions Photopolymerizable compositions

1980-03-06

1981-03-24

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415918, 20415919, 20415923, 430283, 430285, 430286, 430287, 430288, 430905, 430908, 430910, 430920, G03C 168

Patent

active

042581214

ABSTRACT:
A photopolymerizable composition comprising a monomer having at least two ethylenically unsaturated groups, which can be photopolymerized by actinic radiation, a photopolymerization initiator represented by the formula: ##STR1## wherein A represents an arylene group, a substituted arylene group, an alkylene group, a substituted alkylene group, an alkenylene group, or a substituted alkenylene group and R represents an alkyl group, a substituted alkyl group, an aryl group or a substituted aryl group, and optionally a linear organic high molecular weight polymer and a sensitizer. The composition is useful for photosensitive layers of photosensitive printing plates, photoresists, etc.

REFERENCES:
patent: 2902365 (1959-09-01), Martin
patent: 2927022 (1960-03-01), Martin
patent: 3844790 (1974-10-01), Chang et al.
patent: 3870524 (1975-03-01), Watanabe et al.
patent: 4009324 (1977-02-01), Freedman et al.
patent: 4052367 (1977-10-01), Wilson

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