Photopolymerizable composition, light sensitive planographic...

Details Photopolymerizable composition, light sensitive planographic... Photopolymerizable composition, light sensitive planographic...

2007-09-18

2007-09-18

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S286100, C430S288100, C430S302000, C430S494000, C430S944000, C430S964000

Reexamination Certificate

active

11322375

ABSTRACT:
Disclosed is a photopolymerizable composition containing an addition-polymerizable ethylenically unsaturated compound, a photopolymerization initiator, a polymer binder, and a sensitizing dye represented by the following formula (A),wherein R1, R2, R3, R4, R5and X are as defined in the specification.

REFERENCES:
patent: 5738974 (1998-04-01), Nagasaka et al.
patent: 6010824 (2000-01-01), Komano et al.
patent: 2004/0219459 (2004-11-01), Hirabayash
patent: 704 764 (1996-04-01), None
patent: 2006-142552 (2006-06-01), None

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