Photopolymerizable composition including an unsaturated monomer,

Details Photopolymerizable composition including an unsaturated monomer, Photopolymerizable composition including an unsaturated monomer,

1987-03-11

1988-09-27

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430920, 430288, 430925, 522902, 522 26, 522167, 522 63, G03C 168

Patent

active

047741635

ABSTRACT:
The present invention relates to a photopolymerizable composition which comprises

REFERENCES:
patent: 3615451 (1971-10-01), Hickmann
patent: 4212970 (1980-04-01), Iwasaki
patent: 4239850 (1980-12-01), Kita et al.
patent: 4537855 (1985-08-01), Ide
patent: 4598036 (1986-07-01), Iwasaki et al.

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