Photopolymerizable composition for use in an alkaline-etch resis

Details Photopolymerizable composition for use in an alkaline-etch resis Photopolymerizable composition for use in an alkaline-etch resis

1994-07-25

1995-05-30

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430905, 430910, G03F 7033

Patent

active

054199980

ABSTRACT:
In an aqueous-developable dry-film photoresist containing a carboxyl-group containing film-forming polymeric binder, the improvement wherein the binder is obtained by polymerizing a mixture including: (a) a monomer of the formula H.sub.2 C.dbd.CRCOO[(C.sub.n H.sub.2n)X(C.sub.p H.sub.2p)].sub.m R', wherein R is hydrogen or methyl and R' is a saturated or unsaturated C.sub.5 -C.sub.12 bridged alkyl optionally substituted by at least one C.sub.1 -C.sub.4 alkyl or halogen, X is oxygen or sulfur, n is 2-4, p is 0-4, m is 0-2; and (b) at least one C.sub.3 -C.sub.15 .alpha.,.beta.-unsaturated carboxyl-containing monomer having 3-15 carbon atoms.

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