Photopolymerizable composition containing heterocyclic additives

Details Photopolymerizable composition containing heterocyclic additives Photopolymerizable composition containing heterocyclic additives

1984-07-02

1985-09-24

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415918, 20415922, 20415923, 20415924, 430281, 430919, 430922, 430924, G03C 168

Patent

active

045433186

ABSTRACT:
A photopolymerizable composition is described, comprising (1) a non-gaseous ethylenically unsaturated compound which has at least two ethylenically unsaturated terminal groups and is capable of forming a polymer, (2) a thermoplastic polymeric binder, (3) a photopolymerization initiator which is activated by actinic radiation, and (4) at least one of certain heterocyclic compounds. The composition is useful as a photoresist for producing printed circuit boards, printing plates, etc., by etching or plating, and the photoresist has superior adhesion with respect to the base.

REFERENCES:
patent: 3068098 (1962-12-01), Williams
patent: 3577240 (1971-04-01), Nishio et al.
patent: 3650745 (1972-03-01), Hachmann et al.
patent: 4040922 (1977-08-01), Wang et al.
patent: 4279982 (1981-07-01), Iwasaki et al.

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