Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-02-10
1998-05-26
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430914, 430915, 430916, 430920, 430944, 522 16, 522 26, G03C 173
Patent
active
057562580
ABSTRACT:
The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): ##STR1## The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presentized plates for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.
REFERENCES:
patent: 5190849 (1993-03-01), Santoh et al.
patent: 5256794 (1993-10-01), Satoh et al.
patent: 5527659 (1996-06-01), Yamaoka et al.
Ito Yukiyoshi
Kawato Hitoshi
Koseki Kenichi
Obara Mitsuharu
Shimizu Ikuo
Codd Bernard P.
Kyowa Hakko Co., Ltd.
Lesmes George F.
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