Photopolymerizable composition comprising tertiary aromatic amin

Details Photopolymerizable composition comprising tertiary aromatic amin Photopolymerizable composition comprising tertiary aromatic amin

1984-10-12

1986-06-10

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430916, 430920, 522 26, G03C 168, C08F 246, C08F 818

Patent

active

045943109

ABSTRACT:
A photopolymerizable composition comprising an addition-polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator, characterized in that the initiator comprises (a) a compound of the formula: ##STR1## wherein R.sup.1 and R.sup.2 are alkyl group, n is 1, 2 or 3 and ring A is an aromatic ring containing nitrogen atom, and (b) hexaarylbiimidazole. The initiator may additionally contain a thiol of the formula: ##STR2## wherein Z is --O--,--S-- or --NH--. The composition is not only highly sensitive to ultraviolet ray but also highly stable in storage.

REFERENCES:
patent: 3479185 (1969-11-01), Chambers, Jr.
patent: 3782951 (1974-01-01), Lee
patent: 3844790 (1974-10-01), Chang et al.
patent: 4282309 (1981-08-01), Laridon et al.
patent: 4311783 (1982-01-01), Dessauet
patent: 4346162 (1982-08-01), Abele et al.
patent: 4410621 (1983-10-01), Wada et al.
patent: 4459349 (1984-07-01), Tanaka et al.

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