Photopolymerizable composition and photosensitive lithographic p

Details Photopolymerizable composition and photosensitive lithographic p Photopolymerizable composition and photosensitive lithographic p

1992-07-08

1995-01-03

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430916, 430919, 522 14, 522 18, 522 25, 522 26, 522 28, G03C 1725

Patent

active

053785797

ABSTRACT:
A photopolymerizable composition comprising

REFERENCES:
patent: 4278751 (1981-07-01), Specht et al.
patent: 4868092 (1989-09-01), Kawahata et al.

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