Photopolymerizable composition and photosensitive lithographic p

Details Photopolymerizable composition and photosensitive lithographic p Photopolymerizable composition and photosensitive lithographic p

1996-07-11

1998-11-17

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522 96, G03F 7029, G03F 7028, G03F 7031

Patent

active

058374221

ABSTRACT:
A photopolymerizable composition comprising addition-polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator system, wherein, as the addition-polymerizable ethylenically unsaturated double bond-containing compounds, a compound (A) having at least 2 urethane bonds and at least 6 ethylenically unsaturated double bonds, and a compound (B) having no urethane bond and at least 3 ethylenically unsaturated double bonds, are contained in a weight ratio of from 4:1 to 1:4.

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patent: 4857654 (1989-08-01), Riediker et al.
patent: 5236968 (1993-08-01), Hirschmann
patent: 5336716 (1994-08-01), Kappes et al.
15206-55-0, Registry, Copyright 1997 ACS.

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