Photopolymerizable composition and photosensitive lithographic p

Details Photopolymerizable composition and photosensitive lithographic p Photopolymerizable composition and photosensitive lithographic p

1995-08-29

1998-04-14

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302811, 430947, 430926, 430919, 430920, 4302851, 522 14, 522 26, G03F 7029

Patent

active

057389748

ABSTRACT:
A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises:

REFERENCES:
patent: 5011755 (1991-04-01), Rohde et al.
patent: 5045434 (1991-09-01), Yoshihara et al.
English Translation of Japanese Kokai 4-184344 Already of Record Cited as Yamashita et al.

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