Photopolymerizable composition and dry film resist

Details Photopolymerizable composition and dry film resist Photopolymerizable composition and dry film resist

1998-06-26

2000-03-07

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 430914, G03C 1725

Patent

active

060338296

ABSTRACT:
An ultraviolet and/or visible light curing photopolymerizable composition comprising as essential components: (a) a thermoplastic polymer obtained by copolymerization of at least one monomer selected from among .alpha.,.beta.-unsaturated carboxyl group-containing monomers and another monomer, (b) a crosslinking monomer with at least two ethylenic unsaturated groups per molecule and (c) an ultraviolet and/or visible light polymerization initiator comprising a quaternary boron salt and a sensitizing dye, as well as a dry film resist containing the composition as its main component.

REFERENCES:
patent: 4917977 (1990-04-01), Smothers
patent: 4950581 (1990-08-01), Koike et al.
patent: 4985343 (1991-01-01), Kushi et al.
patent: 5143818 (1992-09-01), Weed et al.
patent: 5200292 (1993-04-01), Shinozaki et al.
patent: 5346801 (1994-09-01), Watanabe et al.
patent: 5500453 (1996-03-01), Toba et al.
patent: 5952152 (1999-09-01), Cunningham et al.

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