Photopolymerizable composition

Details Photopolymerizable composition Photopolymerizable composition

2006-09-19

2006-09-19

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C522S104000, C522S150000

Reexamination Certificate

active

07108952

ABSTRACT:
A photopolymerizable composition comprising a polymer having a radical polymerizable group and a unit represented by the following formula (I):wherein Q1represents a cyano group or COX2; X1and X2each independently represent —R— or a halogen atom, R represents a hetero atom; Raand Rbeach independently represent a hydrogen atom, a halogen atom, a cyano group or an organic residual group; X1and X2may be taken together to form a cyclic structure; Raand Rbmay be taken together to form a cyclic structure; and X1and Raor Rbmay be taken together to form a cyclic structure.

REFERENCES:
patent: 2850445 (1958-09-01), Oster
patent: 4708925 (1987-11-01), Newman
patent: 1 091 247 (2001-04-01), None
patent: 1 249 731 (2002-10-01), None
patent: 44-20189 (1969-08-01), None
patent: 8-276558 (1996-10-01), None
patent: 2001031983 (2001-02-01), None
Chemical Abstract 134:133979 for JP 2001031983, Feb. 2001.
European Search Report dated May 21, 2003.

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