Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-08-18
1997-03-04
Dote, Janis L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430916, 430920, 430926, 522 24, 522 25, 522 26, G03C 173, G03F 7028
Patent
active
056078170
ABSTRACT:
A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises:
REFERENCES:
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4505793 (1985-03-01), Tamoto et al.
patent: 4594310 (1986-06-01), Nagasaka
patent: 4886735 (1989-12-01), Boettcher et al.
patent: 4962011 (1990-10-01), Aldag et al.
patent: 4966830 (1990-10-01), Nagasaka et al.
Nagasaka Hideki
Tsuchiyama Masaaki
Urano Toshiyuki
Dote Janis L.
Mitsubishi Chemical Corporation
LandOfFree
Photopolymerizable composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photopolymerizable composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2145187