Photopolymerizable composition

Details Photopolymerizable composition Photopolymerizable composition

1988-11-10

1990-07-03

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430915, 430916, 430920, 430922, 430925, 430926, 522 24, 522 25, 522 26, G03C 168

Patent

active

049390694

ABSTRACT:
Disclosed is a photopolymerizable composition which is very sensitive to light, especially visible light having a wave length of 600 to 700 nm. The photopolymerizable composition comprising a polymerizable compound having an ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator comprises (a) a specific sensitizer and (b) a radical forming agent.

REFERENCES:
patent: 4391686 (1983-07-01), Miller et al.
patent: 4766055 (1988-08-01), Kawabata et al.
patent: 4868092 (1989-09-01), Kawabata et al.

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