Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-05-11
2000-07-04
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302881, 430910, 522114, 522121, 522126, 524 96, 524247, 524249, 524251, G03C 173, C08J 534, C08J 517, C08L 517
Patent
active
060836601
ABSTRACT:
Photopolymerizable plastisol and organosol photoresist and solder mask coating compositions are described herein. These compositions include an ethylenically unsaturated photopolymerizable liquid plasticizer; a particulate, thermoplastic resin is dispersed in the plasticizer, the said resin having a midpoint Tg greater than 110.degree. C. and an acid number greater than 110; a tertiary amine stabilizer; and a photoinitiator. The organosol includes a diluent along with the other ingredients.
REFERENCES:
patent: 2548433 (1951-04-01), Klein et al.
patent: 3845066 (1974-10-01), Vasta
patent: 3940349 (1976-02-01), Corbett
patent: 4071639 (1978-01-01), Palmer et al.
patent: 4276366 (1981-06-01), McCartin et al.
patent: 4309331 (1982-01-01), Graham
patent: 4357413 (1982-11-01), Cohen et al.
patent: 4414354 (1983-11-01), Slocombe
patent: 4454219 (1984-06-01), Yamadera et al.
patent: 4537805 (1985-08-01), Lin
patent: 4877714 (1989-10-01), Tsunoda et al.
patent: 4957850 (1990-09-01), Kusuda et al.
patent: 4996132 (1991-02-01), Tazawa et al.
Ehrhart Wendell A.
Smith David A.
Armstrong World Industries Inc.
Codd Bernard
LandOfFree
Photopolymerizable, coatable organosol and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photopolymerizable, coatable organosol and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable, coatable organosol and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1484708