Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-03-10
1995-08-29
Chapman, Mark A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430288, 522 22, 522 28, 522 66, G03C 1725, G03F 7028, C08F 248, C08J 328
Patent
active
054459184
ABSTRACT:
High sensitivity photopolymerisable compositions comprising a polymerisable ethylenically unsaturated compound and a photoinitiator composition comprising a titanocene compound and N-phenylglycine or a derivative thereof.
REFERENCES:
patent: 4278751 (1981-07-01), Specht
patent: 4289844 (1981-09-01), Specht
patent: 4857654 (1989-08-01), Riediker
patent: 4987056 (1991-01-01), Imahashi
patent: 4987057 (1991-01-01), Kaji
patent: 5008302 (1991-04-01), Husler
patent: 5034429 (1991-07-01), Kaji
patent: 5049479 (1991-09-01), Zertani
patent: 5112721 (1992-05-01), Kuchta
patent: 5153236 (1992-10-01), Kaji
Doba Takahisa
Watanabe Bunya
Chapman Mark A.
Zeneca Limited
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