Photopolymer composition suitable for lithographic printing...

Details Photopolymer composition suitable for lithographic printing... Photopolymer composition suitable for lithographic printing...

2007-01-30

2007-01-30

Hamilton, Cynthia (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S284100, C430S278100, C430S273100, C430S302000

Reexamination Certificate

active

10536510

ABSTRACT:
Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.

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Huang et al, “Curing and Cimbustion Properites of a PU-Coating System with UV-Reactive Phosphazene”, Journal of Applied Polymer Science, vol. 85, 2002, pp. 1980-1991.

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