Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Reexamination Certificate
2011-07-05
2011-07-05
Huff, Mark F (Department: 1721)
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
C118S721000
Reexamination Certificate
active
07972442
ABSTRACT:
A photoplate for manufacturing a deposition mask that is used to form a matrix of pixel areas used in a display panel. The photoplate comprises a layer of material such as quartz, on which a matrix of pixel etching areas is defined. The pixel etching areas are configured to form pixel areas having a specified separation from each other in a vertical direction. The pixel etching areas on the photoplate include an outer periphery having a generally rectangular shape with elongated corners.
REFERENCES:
patent: 4528246 (1985-07-01), Higashinakagawa et al.
patent: 5280215 (1994-01-01), Ohtake et al.
patent: 5396146 (1995-03-01), Nakamura et al.
patent: 6033766 (2000-03-01), Block et al.
patent: 6194104 (2001-02-01), Hsu
patent: 6229255 (2001-05-01), Kim et al.
patent: 6306229 (2001-10-01), Ide et al.
patent: 6858355 (2005-02-01), Wang et al.
patent: 62-290828 (1987-12-01), None
patent: 02-050919 (1990-02-01), None
patent: 02-117703 (1990-05-01), None
patent: 2000-256747 (2000-09-01), None
Fraser Stewart A
Huff Mark F
Rader & Fishman & Grauer, PLLC
Sony Corporation
Sony Electronics Inc.
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