Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-04-05
2011-04-05
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S325000, C430S326000, C430S330000, C430S905000, C430S907000, C430S919000, C430S921000, C430S925000
Reexamination Certificate
active
07919225
ABSTRACT:
A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C.
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DERWENT English abstract for JP2007-262257.
Machine-assisted English translation of JP2007-262257 as provided by JPO.
Allen Robert D.
Brock Phillip Joe
Davis Blake W.
Dubois Geraud Jean-Michel
Lin Qinghuang
International Business Machines - Corporation
Lee Sin J.
Schmeiser Olsen & Watts
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