Photopatternable deposition inhibitor containing siloxane

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S270100

Reexamination Certificate

active

07846644

ABSTRACT:
An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a photopatternable deposition inhibitor material to the substrate, wherein the deposition inhibitor material comprises an organosiloxane compound; and patterning the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.

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Ashwini Sinha, et al., “Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry,” pp. 2523-2532, J. Vac. Sci. Technol. B 24(6), Nov./Dec. 2006.

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