Photon enhanced reactive ion etching

Details Photon enhanced reactive ion etching Photon enhanced reactive ion etching

1978-08-21

1980-01-15

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

118722, 156345, 156646, 204192C, 204192E, 250531, 427 38, H01L 21306, C03C 1500, C03C 2506

Patent

active

041837800

ABSTRACT:
A method and apparatus for modifying a surface, by either plasma etching the surface or plasma depositing a material thereon, by using vacuum ultraviolet radiation to control the modification of the surface.

REFERENCES:
patent: 3095332 (1963-06-01), Ligenza
patent: 3095341 (1963-06-01), Ligenza
patent: 3303319 (1967-02-01), Steigerwald
patent: 3551213 (1970-12-01), Boyle
patent: 3738926 (1973-06-01), Westwood et al.
patent: 3791952 (1974-02-01), Labuda et al.
patent: 3918383 (1975-11-01), Hahn
patent: 4123663 (1978-10-01), Horiike

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