Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-07-13
2010-06-08
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S022000
Reexamination Certificate
active
07732105
ABSTRACT:
Provided are a photomask and a method of fabricating a semiconductor device. The photomask includes a photomask substrate including a chip region and a scribe lane region, with an overlay mark formed in the scribe lane region. The overlay mark includes one or more sub-overlay marks. Each of the sub-overlay marks includes a plurality of unit regions sequentially connected to each other and having different widths, where the width of a given unit region is constant.
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English language abstract of Japanese Publication No. 10-289842.
English language abstract of Korean Publication No. 1998-0081264.
English language abstract of Korean Publication No. 2001-0005118.
English language abstract of Japanese Publication No. 2005-317617.
Kim Joong-Sung
Yoo Do-Yul
You Ji-Yong
Youn Hyung-Joo
Myers Bigel & Sibley Sajovec, PA
Rosasco Stephen
Samsung Electronics Co,. Ltd.
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