Photomask quality estimation system and method for use in...

Details Photomask quality estimation system and method for use in... Photomask quality estimation system and method for use in...

2006-06-27

2009-12-22

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C430S005000, C430S030000

Reexamination Certificate

active

07636910

ABSTRACT:
A photomask quality estimation system comprises a measuring unit, a latitude computation unit and an estimation unit. The measuring unit measures the mask characteristic of each of a plurality of chip patterns formed on a mask substrate. The latitude computation unit computes the exposure latitude of each chip pattern based on the mask characteristic. The estimation unit estimates the quality of each chip pattern based on the exposure latitude.

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patent: 6208469 (2001-03-01), Matsuura
patent: 6649310 (2003-11-01), Itoh et al.
patent: 7090949 (2006-08-01), Nojima et al.
patent: 7229721 (2007-06-01), Mimotogi et al.
patent: 2004/0137340 (2004-07-01), Mimotogi et al.
patent: 2002-72440 (2002-03-01), None

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