Photomask, photomask fabrication method, pattern formation...

Details Photomask, photomask fabrication method, pattern formation... Photomask, photomask fabrication method, pattern formation...

2011-03-01

2011-03-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07897298

ABSTRACT:
A mask pattern including a light-shielding portion101and a semi-light-shielding portion102is provided on a transparent substrate100having a transparent property against exposing light so as to be surrounded with a transparent portion104. The semi-light-shielding portion102is disposed in an outer region of the mask pattern and partially transmits the exposing light in an identical phase to the exposing light passing through the transparent portion104.

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Japanese Office Action, with English Translation, issued in Japanese Patent Application No. JP 2007-528495 dated on Sep. 2, 2008.

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