Photomask image inspection

Details Photomask image inspection Photomask image inspection

2011-07-05

2011-07-05

Tsai, Carol S (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Quality evaluation

C702S035000, C702S082000, C382S144000, C382S149000, C430S005000, C700S109000, C700S117000

Reexamination Certificate

active

07974802

ABSTRACT:
A method optimizes photomask inspection. After masks are manufactured, the method predicts the likelihood that the masks will be defect free based on defect criteria, etch area, etch mode, and etch tool type associated with the masks. The method skips an initial mask inspection for masks that have a predictability value above a predetermined value and performs the initial mask inspection for masks that have a predictability value below the predetermined value. After initial inspection is preformed (or skipped), a pellicle is mounted on the mask and then all masks are inspected or reinspected for defects and foreign matter.

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