Photomask haze reduction via ventilation

Details Photomask haze reduction via ventilation Photomask haze reduction via ventilation

2007-04-25

2010-11-23

Glick, Edward J (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S075000, C355S077000, C359S509000

Reexamination Certificate

active

07839480

ABSTRACT:
Where a framed pellicle is mounted on a photomaps, the framed pellicle comprises a pellicle frame and a pellicle membrane coupled to the pellicle frame, the pellicle frame has first and second apertures each communicating a first space surrounded by the photomask and the framed pellicle with a second space outside of the framed pellicle, exposing a photoresist layer formed on a substrate by flowing gas from within the first space to outside the framed pellicle through the first aperture while simultaneously exposing the photoresist layer to ultraviolet light through the pellicle membrane and the photomask.

REFERENCES:
patent: 4521089 (1985-06-01), Bohl et al.
patent: 6593034 (2003-07-01), Shirasaki
patent: 6791661 (2004-09-01), Sato
patent: 6803161 (2004-10-01), Shiraski
patent: 6803996 (2004-10-01), Kamono
patent: 2002/0057425 (2002-05-01), Nakano
patent: 2003/0117609 (2003-06-01), Kamono
Jaehyuck Choi et al., “Real Time Analysis of the Haze Environment Trapped Between the Pellicle Film and the Mask Surface,” Photomask, Bacus News, Sep. 2006, vol. 22, Issue 9, 12 pages.

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