Photomask having a test pattern that includes separate...

Details Photomask having a test pattern that includes separate... Photomask having a test pattern that includes separate...

2009-12-02

2010-12-21

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07855037

ABSTRACT:
A photomask having a test pattern is provided for detecting focus variation in a lithographic process. A photomask having a test pattern is adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during the lithographic process.

REFERENCES:
patent: 6063531 (2000-05-01), Singh et al.
patent: 6440616 (2002-08-01), Izuha et al.
patent: 2005/0123837 (2005-06-01), Chen

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