Photomask having a patterned carbon light-blocking coating

Details Photomask having a patterned carbon light-blocking coating Photomask having a patterned carbon light-blocking coating

1985-04-02

1987-11-03

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430323, 430945, 427228, 427240, 427140, 427 531, G03F 900

Patent

active

047043423

ABSTRACT:
A photomask for use in manufacturing integrated circuits is fabricated by coating a thin film of organic material, generally a solution of a thermally decomposable hydrocarbon, onto a glass plate and heating it in a reducing atmosphere to convert it into carbon. The carbon layer is masked and etched; for example, in an oxygen plasma, to produce the mask.

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Lyons et al., "Thin Pinhole-Free Carbon Films", Thin Solid Films, 103 (1983), 333-34.

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