Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2007-11-27
2007-11-27
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S319000, C430S320000, C430S325000
Reexamination Certificate
active
11328788
ABSTRACT:
Photomasks that are used to form a fine contact hole array, a method of fabricating the photomask, and use of the photomask. The photomask includes a transparent substrate; a plurality of line-type opaque patterns being formed on the transparent substrate, for defining floodlighting portions for forming patterns; and phase-shifting regions being arranged on the transparent substrate between the opaque patterns at predetermined intervals, the phase-shifting regions defining floodlighting portions for contact holes. A fine and dense contact hole array can be easily formed using the photomask together with a customized illumination. Therefore, a fine contact hole of a good quality can be formed directly on a photoresist using the photomask without additional processes.
REFERENCES:
patent: 6114095 (2000-09-01), Nakabayashi et al.
patent: 6524751 (2003-02-01), Stanton et al.
patent: 7022438 (2006-04-01), Kim
F. Chau & Associates LLC
Samsung Electronics Co., ltd.
Young Christopher G.
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