Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-12-20
2005-12-20
Smith, Matthew (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C700S120000, C700S121000, C378S035000, C430S005000, C250S492300
Reexamination Certificate
active
06978437
ABSTRACT:
A photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufactured with the photomask are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region including an antenna ratio less than a first design rule. A feature located in the identified region is moved based on a second design rule from a first position to a second position in the mask layout file to create a space in the identified region. A grounding feature is placed in the space and automatically connected to a gate feature in the mask layout file such that the antenna ratio is increased to greater than or approximately equal to the first design rule.
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U.S. Appl. No. 10/393,690 entitledSystem and Method for Generating a Mask Layout File to Eliminate Antenna Effects in an Integrated Circuitfiled by Rittman et al. on Mar. 20, 2003; 52 pages.
Oren Micha
Rittman Danny
Kik Phallaka
Smith Matthew
Toppan Photomasks, Inc.
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