Photomask arrangement protecting reticle patterns from electrost

Details Photomask arrangement protecting reticle patterns from electrost Photomask arrangement protecting reticle patterns from electrost

1997-09-05

1999-11-23

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059897546

ABSTRACT:
A photomask arrangement is disclosed to prevent the reticle patterns of a photomask from peeling caused by electrostatic discharge damage. The photomask includes: a substrate; a plurality of metal shielding layers formed on the surface of the substrate to provide the reticle patterns, wherein each two of the metal shielding layers are spaced apart by a clear scribe line; and a plurality of metal lines formed on the clear scribe line to connect the adjacent metal shielding layers, thereby increasing the effective surface area of the reticle patterns.

REFERENCES:
patent: 4587184 (1986-05-01), Schneider-Gmelch et al.
patent: 5403683 (1995-04-01), Ohta et al.
patent: 5798192 (1998-08-01), King et al.

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