Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1995-04-07
1996-11-26
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430322, 430394, 430397, G03C 500
Patent
active
055784216
ABSTRACT:
A semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination. A pattern is formed employing the semitransparent phase shifting mask.
REFERENCES:
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4890309 (1989-12-01), Smith et al.
patent: 5328807 (1994-07-01), Tanaka et al.
patent: 5364716 (1994-11-01), Nakagawa et al.
Journal of Vacuum Science Technology, 16(6), Nov./Dec. 1979, "Spatial period division-A new technique for exposing submicrometer-line width periodic and quasiperiodic patterns", Flanders et al, pp. 1949-1952.
Hasegawa Norio
Hayano Katsuya
Murai Fumio
Hitachi , Ltd.
Rosasco S.
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