Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1999-07-23
2000-07-11
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430322, G03C 500
Patent
active
060870745
ABSTRACT:
A semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination. A pattern is formed employing the semitransparent phase shifting mask.
REFERENCES:
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4890309 (1989-12-01), Smith et al.
patent: 5328807 (1994-07-01), Tanaka et al.
patent: 5364716 (1994-11-01), Nakagawa et al.
patent: 5429896 (1995-07-01), Hasegawa et al.
patent: 5429897 (1995-07-01), Yoshioka et al.
patent: 5578421 (1996-11-01), Hasegawa et al.
patent: 5589305 (1996-12-01), Tomofuji et al.
patent: 5595844 (1997-01-01), Tomofuji et al.
patent: 5656400 (1997-08-01), Hasegawa et al.
patent: 5660956 (1997-08-01), Tomofuji et al.
patent: 5837405 (1998-11-01), Tomofuji et al.
Journal of Vacuum Science Technology, 16(6), Nov./Dec. 1979, "Spatial period division-A new technique for exposing submicrometer-line width periodic and quasiperiodic patterns", Flanders et al, pp. 1949-1952.
Hasegawa Norio
Hayano Katsuya
Murai Fumio
Hitachi , Ltd.
Rosasco S.
LandOfFree
Photomask and pattern forming method employing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photomask and pattern forming method employing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask and pattern forming method employing the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-540560