Photomask and method of making thereof

Details Photomask and method of making thereof Photomask and method of making thereof

2011-02-22

2011-02-22

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S270100, C430S394000

Reexamination Certificate

active

07892705

ABSTRACT:
The disclosure is related to photomasks used in photolithography and methods of making photomasks. The method involves providing a transparent substrate with one or more reflective films disposed over a surface of the substrate, applying a photoresist to the solution-contacted reflective film and forming a pattern in the photoresist that is transferred to the substrate, and developing the pattern on the substrate by removing the remaining portions of the photoresist. The substrate carrying the patterned reflective film is then contacted with a solution comprising oxyanions. The disclosure is also related to photomasks made using the disclosed method.

REFERENCES:
patent: 4336316 (1982-06-01), Sato
patent: 6436605 (2002-08-01), Angelopoulos et al.
patent: 2004/0196447 (2004-10-01), Watanabe
patent: 2004/0196579 (2004-10-01), Shoki
patent: 2007/0224523 (2007-09-01), Huh et al.

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