Photomask and method of controlling transmittance and phase...

Details Photomask and method of controlling transmittance and phase... Photomask and method of controlling transmittance and phase...

2004-12-23

2008-12-16

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07465524

ABSTRACT:
A photomask and a method of controlling a transmittance and phase of light using the photomask are disclosed. The photomask comprises a transparent substrate, and a plurality of lattices formed on the back face of the transparent substrate. The plurality of lattices are binary lattices, each having a duty ratio and a tilt angle. The duty ratio and tilt angle are controlled together in order to simultaneously control transmittance and phase of light transmitted through the photomask.

REFERENCES:
patent: 6379868 (2002-04-01), White
patent: 2003/0230816 (2003-12-01), Kappe et al.
patent: P1997-0016787 (1997-04-01), None
patent: 100161389 (1998-08-01), None
patent: 1020030067039 (2003-08-01), None

Affiliated with

Also associated with

Rating

Photomask and method of controlling transmittance and phase... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask and method of controlling transmittance and phase..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask and method of controlling transmittance and phase... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4042682