Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-06-21
2005-06-21
Thompson, A. M. (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
06910203
ABSTRACT:
A photomask and method for qualifying the same with a prototype specification are disclosed. The method includes comparing a plurality of die sites formed in a patterned layer on a photomask with a prototype specification. If at least one of the die sites complies with the prototype specification, the photomask is selected for used in a semiconductor manufacturing process.
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Baker & Botts L.L.P.
Bowers Brandon W.
Thompson A. M.
Toppan Photomasks, Inc.
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