Photomask and method for producing the same

Details Photomask and method for producing the same Photomask and method for producing the same

2006-02-21

2006-02-21

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S322000, C430S323000, C430S324000, C430S396000

Reexamination Certificate

active

07001694

ABSTRACT:
A photomask includes a semi-light-shielding portion having a light-shielding property, a light-transmitting portion surrounded by the semi-light-shielding portion and a peripheral portion positioned in a periphery of the light-transmitting portion on a transparent substrate. The semi-light-shielding portion and the light-transmitting portion transmit the exposure light in the same phase each other, whereas the peripheral portion transmits the exposure light in a phase opposite to that of the light-transmitting portion. A phase shift film that transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in the semi-light-shielding portion formation region.

REFERENCES:
patent: 5766805 (1998-06-01), Lee et al.
patent: 5906910 (1999-05-01), Nguyen et al.
patent: 08-227142 (1996-09-01), None
patent: 9-90601 (1997-04-01), None
patent: 10-048806 (1998-02-01), None
patent: 2000-019710 (2000-01-01), None

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