Photomask, an exposure method and a projection exposure apparatu

Details Photomask, an exposure method and a projection exposure apparatu Photomask, an exposure method and a projection exposure apparatu

1995-12-18

1997-01-07

Gellner, Michael L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, 355 71, 359586, 359637, 430 5, G03B 2752

Patent

active

055922597

ABSTRACT:
A photomask is provided having a stepped portion formed on at least one of a first and second areas corresponding to a stepped structure within an exposure area on the sensitive substrate onto which the pattern is to be exposed to make different height positions of the first and second areas of the pattern forming surface of the transparent substrate in the optical axis direction of the projection optical system. Also provides is an exposure method involving the step of shifting an image forming surface of a projection optical system in an optical axis direction corresponding to a stepped structure of an exposure area on a sensitive substrate. The image forming surface of the projection optical system coincides with the exposure area surface when exposing the pattern on an original substrate onto the sensitive substrate through the projection optical system. A projection exposure apparatus is also provided including a projection optical system for projecting and forming an image of a pattern on the original substrate on the sensitive substrate, and a stage for retaining the sensitive substrate so that the surface of the sensitive substrate is disposed close to the image forming surface. The exposure apparatus also has an image surface compensating member for shifting the image forming surface in the optical axis direction corresponding to the stepped structure.

REFERENCES:
patent: 4529299 (1985-07-01), Banks et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5140366 (1992-08-01), Shiozawa et al.
patent: 5227838 (1993-07-01), Nakanishi et al.
patent: 5284724 (1994-02-01), Noelscher et al.
patent: 5338647 (1994-08-01), Nakagawa et al.

Affiliated with

Also associated with

Rating

Photomask, an exposure method and a projection exposure apparatu does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask, an exposure method and a projection exposure apparatu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask, an exposure method and a projection exposure apparatu will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1768886