Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging
Patent
1983-09-01
1985-04-30
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Processing feature prior to imaging
430 5, 430311, 427 38, 427 431, G03C 500, G03F 900
Patent
active
045144893
ABSTRACT:
An improved photolithography process is disclosed wherein photoresist masks are treated to reduce the sticking of photoresist to the mask. In many photolithography processes, a photoresist layer is exposed through a photoresist mask having an opaque patterned layer on a surface of the mask. To prevent adhesion of the photoresist to the mask surface when the mask and photoresist are brought into contact, the mask surface is first treated in a fluorine plasma.
REFERENCES:
patent: 3600243 (1971-08-01), La Rocque et al.
patent: 3892900 (1975-07-01), Shima et al.
Garcia Carlos N.
Rigg Bryan C.
Tanner Sally A.
Dees Jos,e G.
Fisher John A.
Kittle John E.
Motorola Inc.
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