Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1987-08-12
1989-03-07
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430316, 430317, 430318, 430323, G03C 518
Patent
active
048106194
ABSTRACT:
For fine line lithography of a reflective substrate, a layer of titanium nitride is applied between the reflective surface and the photoresist that is absorbant at the wavelength of light used to expose the photoresist. The resolution of the photoresist is improved, even when an absorbant dye is used in the photoresist. The titanium nitride can be readily removed at the same time as the reflective layer is patterned, thereby avoiding the need of a separate step to remove the absober layer during etching of the reflective substrate.
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Douglas Edward C.
Lee Brian C.
Pampalone Thomas R.
Doody Patrick A.
General Electric Co.
Glick K. R.
Michl Paul R.
Morris Birgit E.
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