Photolithography mask critical dimension metrology system...

Details Photolithography mask critical dimension metrology system... Photolithography mask critical dimension metrology system...

2007-07-31

2007-07-31

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S053000

Reexamination Certificate

active

11167776

ABSTRACT:
A photolithography mask critical dimension metrology system is provided. The system includes a radiation source, a holder operable to securely hold at least one mask oriented to receive radiation emitted from the radiation source, a projection system operable to direct radiation passing through the at least one mask, and an image capture system operable to receive radiation directed by the projection system and capture a projected image of the at least one mask.

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Kasprowicz, Bryan et al., “Integrating a CD SEM into an optical system for photomask metrology operations”, 12 pages, www.micromagazine.com/archive/00/02/kasprowiez.html.

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