Photolithographic stripping method for removing contrast enhance

Details Photolithographic stripping method for removing contrast enhance Photolithographic stripping method for removing contrast enhance

1985-01-16

1986-11-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

430156, 430166, 430271, 430273, G03C 500, G03C 1124, G03F 726

Patent

active

046236112

ABSTRACT:
A method is provided for stripping a contrast enhancement layer from the surface of a photoresist such as a novolak-based resist without substantially altering its characteristic properties for photolithographic applications. The CEL composite photoresist is immersed or treated with toluene or a mixture thereof in a particular manner.

REFERENCES:
patent: 3725069 (1973-04-01), Hammond
patent: 4395348 (1983-07-01), Lee
patent: 4411978 (1983-10-01), Lavidon et al.
patent: 4578344 (1986-03-01), Griffing et al.

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